Brand: AMAT Description:Chamber Interface Module Condition: Brand New Certificate: COO TEST REPORT WARRANTY LETTER Warranty: 1 year Inventory Qty:3 Payment Term: T/T Shipping Port: Shenzhen AMAT 0100-20453 REV 005 is a DeviceNet digital I/O control board that supports multi-channel digital signal processing and can achieve real-time monitoring and precise execution of process instructions.
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Manufacture |
AMAT |
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Model Number |
0100-20453 |
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Country Of Origin |
USA |
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HS CODE |
85389000 |
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Dimension |
25*10*5cm |
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Packing Dimension |
27*12*7cm |
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Weight |
1kg |
Product parameters
Communication protocol: DeviceNet industrial bus standard, supports high-speed data transmission and multi-node networking
I/O channel configuration:
Digital input channel: supports 24V DC signal acquisition, photoelectric isolation protection, response time ≤1ms.
Digital output channel: drive capacity 0.5A/channel, maximum load current 2A, compatible with relay/solenoid valve control
Electrical characteristics:
Operating voltage: 24V DC ±10%
Power consumption: ≤15W (full load)
Operating temperature: -20°C to 70°C
Features of 0100-20453
1. Industrial real-time control
AMAT 0100-20453 achieves microsecond signal synchronization through the DeviceNet protocol to ensure the precise coordination of the actions of the wafer transfer robot, vacuum valve and other actuators, reducing process delays
2. High reliability redundant design
The board has built-in dual-power isolation and signal filtering circuits. AMAT 0100-20453 can operate stably in the strong electromagnetic interference environment of semiconductor plants, with MTBF (mean time between failures) ≥ 50,000 hours.
3. Flexible expansion and diagnostic functions
0100-20453 supports online modular expansion, compatible with up to 32 I/O nodes; built-in self-diagnosis chip, can report overcurrent and short circuit faults in real time, shortening equipment maintenance downtime.
4. Deep integration of process data
AMAT 0100-20453 directly connects to the central control system of AMAT Centura, Endura and other platforms to achieve seamless collection and closed-loop control of data such as etching chamber pressure sensing and gas flow valve status
Application scenarios
Etching process control
In the plasma etcher, drive the gas injection solenoid valve and monitor the chamber pressure switch status in real time to ensure reaction stability
Thin film deposition monitoring
Link the temperature sensor and cooling water valve of the CVD equipment to prevent uneven film layers caused by wafer overheating
Wafer transfer system
Control the clamping signal of the end-effector of the robotic arm to achieve non-destructive handling of 300mm wafers
