Brand: AMAT Description:CMP Endpoint Controller Board Condition: Brand New Certificate: COO TEST REPORT WARRANTY LETTER Warranty: 1 year Inventory Qty:3 Payment Term: T/T Shipping Port: Shenzhen AMAT 0100-77014 is a control module used in semiconductor manufacturing equipment. It is mainly used for signal processing, system communication and process monitoring. It is integrated into the AMAT equipment platform to ensure stability and real-time performance.
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Manufacture |
AMAT |
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Model Number |
0100-77014 |
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Country Of Origin |
USA |
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HS CODE |
85389000 |
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Dimension |
25*15*3cm |
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Packing Dimension |
27*17*5cm |
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Weight |
1kg |
Technical parameters
Input voltage: DC 24V ±10%
Power consumption: ≤15W
Isolation withstand voltage: 1500V AC/1min
Communication interface: RS-232/RS-485, Ethernet (10/100Mbps)
Operating temperature: 0°C to 50°C
Support 4-20mA analog input/output
Digital I/O: 8 channels
Sampling frequency: 1kHz
Accuracy: ±0.1% FS
Protection level: IP67
Installation method: DIN rail or panel fixed
Functional features
1. Real-time process monitoring and feedback
AMAT 0100-77014 monitors key parameters such as temperature, pressure, flow rate, etc. in real time through high-speed data acquisition module, and dynamically adjusts process parameters in combination with built-in algorithms to ensure the consistency of wafer processing
2. Redundant communication and high reliability design
0100-77014 supports dual-link redundant communication (RS-232 + Ethernet), automatic switching between master and standby devices, ensuring zero downtime operation of AMAT 0100-77014 in 24/7 continuous production
3. Multi-protocol compatibility and system integration
Compatible with industrial protocols such as DNET and Modbus TCP, seamlessly connected to the host computer system of AMAT Endura, Centura and other platforms, to achieve centralized management of process data
4.Safety protection and alarm linkage
AMAT 0100-77014 has built-in overvoltage/overcurrent protection circuit, supports threshold trigger alarm (sound and light/PLC linkage), to prevent equipment damage due to abnormal working conditions
Application scenarios
1.High-energy ion implantation process
Used for the dose control system of VIISta 3000XP/900XP ion implanter, real-time calibration of beam angle and dose uniformity
2.PVD metal deposition monitoring
Monitor the sputtering target temperature and vacuum chamber pressure in the Endura platform to optimize the TiN/Ti film deposition rate.
3.CVD gas flow control
Integrated in the Centura 5200 reaction chamber, dynamically adjust the flow of process gases such as TEOS and SiH₄ to ensure the consistency of film thickness
